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| Cat. No. | Description |
| 0CON-352 Chemcloth Polishing Pad 12" / 300mm diameter, pack of 10 |
Compatible with PM5/PM6 |
| 0CON-353 Chemcloth Polishing Pad 14" / 355mm diameter, pack of 10 |
Compatible with LP50 |
| 0CON-471 Chemcloth Polishing Pad 16" / 400mm diameter, pack of 10 |
Compatible with Tribo |
| 0CON-398 EP1 12" Diameter Grooved - Pack of 5 |
Grooved, expanded Polyurethane Polishing Pad - 0.050" thick W/PSA backing with 10mm XY Grooving (Type 12EP1G). Compatible with PM5/PM6 |
| 0CON-386 EP1 12" Diameter Grooved - Pack of 5 |
Grooved expanded Polyurethane Polishing Pad - 0.050" thick W/PSA backing with 10mm XY Grooving (Type 12EP2G) Compatible with PM5/PM6 |
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Chemcloths are used primarily for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from polishing compression, creating a pumping action that enhances slurry flow within the pad to produce optimum surface finish quality. These properties reduce pad loading and increases pad life.
These pads are suitable for polishing delicate semiconductor materials such as Gallium Arsenide with Chemlox Polishing Fluid.
These pads have a foamed elastometer structure with controlled cells. This unique structure and high hardness improves planarity and is designed for optimum polishing of Silicon, Sapphire and optical materials. The EP1 pads are supplied with a pressure sensitive adhesive backing for excellent flatness control. Shore A Hardness 97.
These pads have a micro-cellular structure that enables it to act in a "sponge like" manner, while maintaining the hardness and flatness. Pads are supplied with a pressure sensitive adhesive backing. Excellent flatness control and fast polishing rates. Shore Hardness 86.
